Rhodium(I)-Catalyzed Silylation of Aryl Halides with Triethoxysilane: Practical Synthetic Route to Aryltriethoxysilanes
Miki Murata*, Masanori Ishikura, Masayuki Nagata, Shinji Watanabe and Yuzuru Masuda
*Department of Materials Science, Kitami Institute of Technology, Kitami 090-8507, Japan, Email: muratamkmail.kitami-it.ac.jp
M. Murata, M. Ishikura, M. Nagata, S. Watanabe, Y. Masuda, Org. Lett., 2002, 4, 1843-1845.
DOI: 10.1021/ol025770p
Abstract
A mild and selective silylation of aryl iodides and bromides with triethoxysilane (EtO)3SiH in the presence of NEt3 and a catalytic amount of [Rh(cod)(MeCN)2]BF4 provides aryltriethoxysilanes in high yield.
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proposed mechanism
M. Murata, K. Ota, H. Yamasaki, S. Watanabe, Y. Masuda, Synlett, 2007, 1387-1390.
M. Murata, R. Shimazaki, S. Watanabe, Y. Masuda, Synthesis, 2001, 2231-2233.
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ID: J54-Y2002-560